Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/50925
Type of publication: Straipsnis konferencijos medžiagoje kitose duomenų bazėse / Article in conference proceedings in other databases (P1c)
Field of Science: Fizika / Physics (N002)
Author(s): Klenauskis, Simas;Sriubas, Mantas;Lelis, Martynas;Žostautienė, Rasa;Milčius, Darius;Laukaitis, Giedrius
Title: Development of TiHh2 using reactive sputtering technique
Is part of: Radiation interaction with material and its use in technologies 2010 : 3rd international conference, Kaunas, Lithuania, 20-23 September, 2010 : program and materials / Kaunas Universitety of Technology, Vytautas Magnus University, Lithuanian Energy Institute, Riga Technical Universitety. Kaunas : Technologija, 2010
Extent: p. 406-409
Date: 2010
Keywords: Titanium hydride films;DC reactive sputtering;Optical reflection;X-ray diffraction
Abstract: Crystalline structure and optical properties of titanium hydride films prepared by reactive magnetron sputtering were investigated with X-ray diffraction and optical spectrometer. In addition, their optical measurements were also carried out in visible infra-red regions. In investigation was found that thin films have fcc structure and ð - phase also established absorbed hydrogen amount in the thin films. Using spectrometer wre achieved reflection spectres
Internet: https://hdl.handle.net/20.500.12259/50925
Affiliation(s): Gamtos mokslų fakultetas
Kauno technologijos universiteta
Kauno technologijos universitetas
Lietuvos energetikos institutas
Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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