Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/40368
Type of publication: Straipsnis konferencijos medžiagoje kitose duomenų bazėse / Article in conference proceedings in other databases (P1c)
Field of Science: Fizika / Physics (N002)
Author(s): Pranevičius, Liudvikas;Bobrovaitė, Birutė;Lelis, Martynas
Title: The distribution of redeposited carbon atoms in tungsten film under ion irradiation
Is part of: Radiation interaction with material and its use in technologies 2006 : international conference, Kaunas, Lithuania, 26-30 September, 2006 : program and materials. Kaunas : Technologija, [2006]
Extent: p. 186-191
Date: 2006
Keywords: Carbon;Tungsten;Plasma materials processing;Metallic thin films;Fusion reactor divertors
Abstract: The W films on stainless steel substrate were grown using magnetron sputter deposition. After the deposition films were irradiated under Ar ions with small amount of carbon. The XRD microstructure and phase composition of as-deposited W film demonstrated nanocrystalline microstructure with the mean size of crystallites equal to about 45 nm. After the characterization of W film properties the samples were moved into vacuum chamber and attached to the water cooled sample holder which was made of graphite. After irradiation of W film under Ar ions in described experimental conditions, three characteristic regions on the W film surface were distinguished: (i) the central region, where C readsorption rate exceeded plasma substrate erosion rate and continuous C film was grown with maximum thickness about 2 microns, (ii) the region of intensive plasma irradiation, where plasma substrate erosion rate exceeded C redeposition rate, and (iii) transfer region, where plasma erosion rate was about equal to C redeposition rate
Internet: https://hdl.handle.net/20.500.12259/40368
Affiliation(s): Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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