Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/43632
Type of publication: Straipsnis konferencijos medžiagoje Clarivate Analytics Web of Science ar/ir Scopus / Article in Clarivate Analytics Web of Science or Scopus DB conference proceedings (P1a)
Field of Science: Fizika / Physics (N002)
Author(s): Urbonavičius, Marius;Tučkutė, Simona;Rajackas, Tomas;Pranevičius, Liudas L
Title: Water vapour plasma oxidation effects on various thickness titanium films
Is part of: Radiation interaction with material and its use in technologies 2012 : 4rd international conference, Kaunas, Lithuania, May 14-17, 2012 : program and materials. Kaunas : Tecnologija, 4 (2012)
Extent: p. 103-106
Date: 2012
Keywords: Ti film;Water vapour;Plasma;Oxidation
Abstract: DC-magnetron sputtering technique was used to produce Ti films of different thicknesses on crystalline Si substrates. Oxidation of these films was performed by water vapour at pressure of 10 Pa. Plasma was generated using radio-frequency (RF) energy source. Experimental results indicate that the oxidation kinetics of Ti films depends on film thickness. XRD patterns of thin and thick Ti films oxidized under the same oxidation conditions reveal their different structure and phase composition. The mean surface roughness increases with the increase in titanium film thickness. The oxidation mechanism of Ti films with different thicknesses is discussed on the basis of the obtained experimental results
Internet: https://hdl.handle.net/20.500.12259/43632
Affiliation(s): Fizikos katedra
Gamtos mokslų fakultetas
Lietuvos energetikos institutas
Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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